Tantalum (V) ethoxide
High purity liquid chemical compound.
Chemical formula: Ta(OC2H5)5.
CAS number: 6074-84-6
Used for CVD, ALD processes of thin film deposition in semiconductor industry.
High purity liquid chemical compound.
Chemical formula: Ta(OC2H5)5.
CAS number: 6074-84-6
Used for CVD, ALD processes of thin film deposition in semiconductor industry.